Niobium Sputtering Target- rotary, Union of China-Europe Non-Ferrous Metals

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Niobium Sputtering Target- rotary

Material：

Nb1, Nb2

Specification：

Purity:Nb 99.95%(3N5)-99.99%(4N)

Manufacturing Standard: ASTM B393,

Grain Size: Typical size<100μm Grain Size

　　　　　　 (Other grain size available upon request )

Flatness: ≤0.2mm

Surface Roughness:< Ra 1.6μm

Surface： Polished

Dimension: niobium target sizes as per request

Impurities:

Metallic impurities, ppm max by weight

Element	Cu	Ti	Mn	Hf	Fe	Al	Mo	Cr	Si	Ta	Ni	W	Zr
Content	10	5	5	20	20	5	10	5	30	200	5	15	50

Non-Metallic impurities, ppm max by weight

Element	N	O	C	H
Content	50	100	50	10

Standard：

ASTM B393

Surface Treatment：

Surface Roughness:< Ra 1.6μm

Features：

Antireflexion film cotaing

Applications：

niobium targets are used in semiconductor industry and optics industry.

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