Product name

tantalum sputtering target

Grade

Ta1,Ta2

Purity

> =99.95%

Characteristic

Melting Point: 2996 C Boiling Point:5425 C Density: 16.6g/cm3 High quality, workability

Certificate

ISO9002

Product Feature

High melting point, High-density, high temperature oxidation resistance, long service life

Table

technology parameter

Application

mainly used as coating, sputtering material.

Grade

Ta1,Ta2

Recrystallization

95%min

Grain size

ASTM 4 or finer

Surface finish

16Rms max. or Ra 0.4 ( RMS64 or better)

Flatness

0.1mm or 0.15% max

Tolerance

+/-0.010" on all dimensions