| 材料： | Tantalum |
| 规格： | Size: Diameter (50-400)mm * Thickness (3-28)mm Grain Size:ASTM 4 or finer Surface finish:16Rms max or Ra0.4 Flatness:0.1mm or 0.15% Max Tolerance: +/- 0.010” or Dimensions |
| 标准： | ASTM B708 |
| 等级： | RO5200,RO5400,RO5252(Ta-2.5W),RO5255(Ta-10W) |
| 最小订单量： | 1 kg |
Tantalum sputtering target, Tantalum Tungsten alloy target
Size: Diameter (50-400)mm * Thickness (3-28)mm
Grain Size:ASTM 4 or finer
Surface finish:16Rms max or Ra0.4
Flatness:0.1mm or 0.15% Max
Tolerance: +/- 0.010” or Dimensions
|
Sputtering target of Ta &Ta Alloy |
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|
Name |
Specifications |
Thickness(mm) |
Width(mm) |
Length(mm) |
Condition |
|
Circular target |
ASTMB708-05 GB/T3629-2006 |
3-28 |
25-400 (Diameter) |
--------- |
Annealed |
|
Rectangular target |
ASTMB708-05 GB/T3629-2006 |
1-20 |
10-1000 |
200-2000 |
Annealed |
|
Special requirments to be agreed on by the supplier and buyer of negotiations
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